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Toppan Photomasks

Photomasks as basic key elements in the semiconductor industry.


CD tolerance :+/-0.1μm-+/-0.2μm

 

cutting tolerance:+/-0.02-+/-0.03mm

 

Manufacturing tolerance affected by thickness and sizes

    product detail

    Product Description


    Photomasks continue to be key elements within the semiconductor industry. They are used mainly in wafer steppers (mask projection lithography) or in the mask aligner (masked ion beam lithography) for the production of integrated circuits (microchips).