Toppan Photomasks Inc

Photomasks continue to be key elements within the semiconductor industry. They are used mainly in wafer steppers (mask projection lithography) or in the mask aligner (masked ion beam lithography) for the production of integrated circuits (microchips).

The choice of the substrate depends largely on the intended end use. For environments with major fluctuations in temperature, for example, substrates with low thermal expansion coefficients (Zerodur, fused silica) are used.

Photomasks as basic key elements in the semiconductor industry.

CD tolerance :+/-0.1μm-+/-0.2μm

cutting tolerance:+/-0.02-+/-0.03mm

Manufacturing tolerance affected by thickness and sizes

Product Detail

product detail

Product Description

Large-scale: photomasks as key elements within the semiconductor industry.

The choice of the substrate depends largely on the intended end use. For environments with major fluctuations in temperature, for example, substrates with low thermal expansion coefficients are used.

Latest technology within Photolithography and cutting.

By using laser technology for the cutting process, it is a non-contact process and cracks on the glass surface and debris on the cutting edge have been eliminated. The cutting process is fully automated and have improved our product quality considerably.

Typical products and marked segments.

Encoder Disc & Grat, linear gratings, positional calibration plates, calibration targets, optical reticles, microfluidic components etc.

For you, this means:

Complete solutions from a single source

Maximum accuracy of structures

Quick lead times

A lean supply chain

Cleaner processes (clean room conditions)

We would be very happy to provide you with customer-specific solutions which can be integrated into your production process.

Graticule Cross Line Etched Optical Flat Reticle